Method for forming a thin film

Details Method for forming a thin film Method for forming a thin film

1995-07-31

1998-10-06

Padgett, Marianne

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

438761, 438763, 438764, 4272552, 4273977, 427559, 427579, 427101, B05D 512, B05D 302, C23C 1600

Patent

active

058173684

ABSTRACT:
Alternate formation of high-resistance and low-resistance layers form a thin film with reduced dopant gradient in its thickness. A desired sheet resistance is attained by adjusting the thickness of the stacked layers, the degree of doping of the film, and the number of layers used to make the thin film during the film formation process.

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