Method for forming a substructure of a multilayered laminate

Details Method for forming a substructure of a multilayered laminate Method for forming a substructure of a multilayered laminate

2002-03-07

2004-12-21

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S846000, C029S831000, C029S829000, C174S261000

Reexamination Certificate

active

06832436

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Technical Field
The present invention relates to conductive substructures of a multilayered laminate and associated methods of fabrication.
2. Related Art
FIGS. 1
,
2
, and
3
illustrate conductive substructures that may appear in a conventional multilayered laminate.
FIG. 1
illustrates a 0S2P substructure
10
,
FIG. 2
illustrates a 2S0P substructure
20
, and
FIG. 3
illustrates a 1S1P substructure
30
. Definitionally, the substructures in this application are described by an adjective of the form nSmP, wherein n and m are non-negative integers, wherein S stands for “signal plane,” and wherein P stands for “power plane.” Thus, “0S2P” connotes 0 signal planes and 2 power planes (n=0, m=2), “2S0P” connotes 2 signal planes and 0 power planes (n=2, m=0), and “1S1P” connotes 1 signal plane and 1 power plane (n=1, m=1). A conventional multilayered laminate comprises stacked substructures which may include any or all of the 0S2P, 2S0P, and 1SLP substructures.
A power plane is characterized by its inclusion of a continuously conductive layer. For example, the 0S2P substructure
10
in
FIG. 1
comprises a power plane
11
which includes a continuously conductive layer
12
, and a power plane
13
which includes a continuously conductive layer
14
. As another example, the 1S1P substructure
30
in
FIG. 3
comprises a power plane
31
which includes a continuously conductive layer
32
. Although not shown in FIGS.
1
and
3
, a power plane may include one or more holes within the continuous conductive layer. The continuous conductive layer of a power plane may include copper.
A signal plane is characterized by its inclusion of a layer comprising conductive circuitry. For example, the 2S0P substructure
20
in
FIG. 2
comprises a signal plane
21
which includes a conductive circuitry
22
, and a signal plane
23
which includes a conductive circuitry
24
. As another example, the 1S1P substructure
30
in
FIG. 3
comprises a signal plane
33
which includes a conductive circuitry
34
. The conductive circuitry of a signal plane may include copper.
A substructure may include a via through its thickness, such as a conductively plated via
27
in the 2S0P substructure
20
in FIG.
2
.
In a substructure, a power plane cannot conductively contact another power plane, a power plane cannot conductively contact a signal plane, and a signal plane cannot conductively contact another signal plane. Thus, power planes and signal planes may be insulatively separated by a dielectric layer. As a first example, the 0S2P substructure
10
in
FIG. 1
comprises a dielectric layer
15
that insulatively separates the power plane
11
from the power plane
13
. As a second example, the 2S0P substructure
20
in
FIG. 2
comprises a dielectric layer
25
that insulatively separates the signal plane
21
from the signal plane
23
. As a third example, the 1S1P substructure
30
in
FIG. 3
comprises a dielectric layer
35
that insulatively separates the power plane
31
from the signal plane
33
.
Unfortunately, some or all of the preceding 0S2P, 2S0P, and 1S1P substructures prevent improved wiring density within the substructures, and thus within the overall multilayered laminate that includes the 0S2P, 2S0P, and 1S1P substructures. With the 2S0P substructure of
FIG. 2
, for example, the conductive circuitry
22
may be required to be oriented at about right angles to the conductive circuitry
24
in order to minimize cross-talk (i.e., noise) due to electromagnetic radiative coupling between the conductive circuitry
22
and the conductive circuitry
24
; i.e., if x and y axes represent orthogonal directions within the signal planes
21
and
23
, then the conductive circuitry
22
would be oriented in the x direction if the conductive circuitry
24
were oriented in the y direction, and vice versa. The aforementioned directional constraints on the conductive circuitry
22
and the conductive circuitry
24
translates into a constraint on wireability (i.e., a constraint on how high the wiring density can be within the signal planes
21
and
23
).
Additionally, with less than optimum wiring density, the geometrical size of the overall multilayered laminate will have to be large enough to accommodate all of the wiring that is physically required for the intended application. The increased size is undesirable, because of at least two reasons. A first reason is that space is likely to be at a premium and a conservation of space is generally strived for in the electronic packaging industry. A second reason is that an increased size is more expensive because of increased material requirements and, more importantly, a requirement to drill longer through holes through the substructures and the overall multilayered laminate.
Moreover, if a highly pliable or flexible dielectric material is used in the substructures, then all three of the 0S2P, 2S0P, and 1S1P substructures will be required to have a thickness that is large enough for the substructures to have sufficient structural rigidity. Note that an organic dielectric material for use in a chip carrier may exemplify a highly pliable or flexible dielectric.
There is a need for conductive substructures for use in multilayered laminates such as chip carriers, wherein the conductive substructures improve wireability, reduce substructure and overall laminate thicknesses, and result in lower fabrication costs.
SUMMARY OF THE INVENTION
The present invention provides a method for forming a 0S1P substructure, comprising:
providing a sheet of conductive material with an exposed first surface and an exposed second surface;
forming a hole through the sheet of conductive material; and
applying a layer of dielectric material to the exposed first surface after the step of forming a hole.
The present invention provides a method for forming a 0S3P substructure, comprising
providing a sheet of conductive material having an exposed first surface and an exposed second surface;
forming a hole through the sheet of conductive material;
applying a first layer of dielectric material to the first surface of the sheet of conductive material, after the step of forming a hole;
applying a second layer of dielectric material to the second surface of the sheet of conductive material, after the step of forming a hole;
applying a first layer of conductive material on the first layer of dielectric material; and
applying a second layer of conductive material on the second layer of dielectric material.
The present invention provides a method for forming a 2S1P substructure, comprising:
providing a sheet of conductive material having an exposed first surface and an exposed second surface;
forming a hole through the sheet of conductive material;
applying a first layer of dielectric material to the first surface of the sheet of conductive material, after the step of forming a hole;
forming a first signal plane on the first layer of dielectric material;
applying a second layer of dielectric material to the second surface of the sheet of conductive material, after the step of forming a hole; and
forming a second signal plane on the second layer of dielectric material.
The present invention provides an electrical structure, comprising: a multilayered laminate that includes a plurality of substructures, wherein a dielectric material of a dielectric layer insulatively separates each pair of successive substructures, and wherein a subset of the plurality of substructures is selected from the group consisting of a 0S1P substructure and a 0S3P substructure, the 0S1P substructure and a 2S1P substructure, the 0S3P substructure and the 2S1P substructure, the 0S1P substructure and the 0S3P substructure and the 2S1P substructure, and the 0S3P substructure.
The present invention provides a 0S3P substructure, comprising:
a sheet of conductive material having a hole therethrough;
a first layer of dielectric material on a first surface of the sheet of conductive material;
a second layer of dielectric material on a second surface o

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