Method for forming a substantially uniform array of sharp tips

Details Method for forming a substantially uniform array of sharp tips Method for forming a substantially uniform array of sharp tips

1996-06-18

1998-05-19

Dang, Thi

Etching a substrate: processes

Forming or treating an article whose final configuration has...

216 42, H01J 900

Patent

active

057531307

ABSTRACT:
A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.

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