Method for forming a stepper focus pattern through determination

Details Method for forming a stepper focus pattern through determination Method for forming a stepper focus pattern through determination

1997-09-12

1999-09-14

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 30, G03F 900

Patent

active

059521325

ABSTRACT:
The present invention discloses a method for forming a pattern for stepper focus which can be monitored by overlay measurements such that a focal plane can be advantageously and accurately determined without human reading errors that are normally observed in conventional methods. The method for forming a stepper focus pattern for determining a focus error can be carried out by using an inner box and an outer box alignment marks and determining the shift in the center point of the two boxes as the overlay error.

REFERENCES:
patent: 5635336 (1997-06-01), Bae
patent: 5665495 (1997-09-01), Hwang

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