Etching a substrate: processes – Forming or treating josephson junction article
Patent
1994-11-09
1996-10-01
Powell, William
Etching a substrate: processes
Forming or treating josephson junction article
216 38, 216 41, 216 66, 216 67, 505329, 505410, B44C 122
Patent
active
055608361
ABSTRACT:
The present invention relates to a method or forming a step on a deposition surface of a substrate for depositing it thin film on it. The method comprises steps of etching a portion of the deposition surface of the substrate and conducting heat treatment of the substrate so as to recover crystallinity of the etched surface. The method can comprise steps of etching a portion of the deposition surface of the substrate and further etching the etched portion of the deposition surface of the substrate slightly so as to remove a degraded surface.
REFERENCES:
patent: 5077266 (1991-12-01), Takagi et al.
patent: 5439875 (1995-08-01), Tanaka et al.
Surface Science Letters, 278 (1992) L153-L158.
Thin Solid Films, 232 (1993) 232-236.
Applied Physics Letter, vol. 57, No. 1, Jul. 2, 1990, pp. 90-92.
Applied Physics Letter, vol. 59, No. 6, Aug. 5, 1991, pp. 739-741.
Applied Physics Letter, vol. 58, No. 3, Jan. 21, 1991, pp. 301-303.
Journal of Applied Physics, vol. 73, No. 11, Jun. 1, 1993, pp. 7543-7548.
Applied Physics Letter, vol. 59, No. 20, Nov. 11, 1991, pp. 2606-2608.
Kerins John C.
Powell William
Sumitomo Electric Industries Ltd.
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