Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Chemically responsive
Patent
1996-06-24
1999-05-25
Fourson, George R.
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Chemically responsive
438 52, 438 53, H01L 2162
Patent
active
059077654
ABSTRACT:
A method for forming a semiconductor sensor device comprises providing a substrate (4) and forming a sacrificial layer (18) over the substrate. The sacrificial layer (18) is then patterned and etched to leave a portion (19) on the substrate (4). A first isolation layer (6) is formed over the substrate (4) and portion (19) of the sacrificial layer and a conductive layer (12), which provides a heater for the sensor device, is formed over the first isolation layer (6). The portion (19) of the sacrificial layer is then selectively etched to form a cavity (10) between the first isolation layer (6) and the substrate (4), the cavity (10) providing thermal isolation between the heater and the substrate.
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Guillemet Jean Paul
Lescouzeres Lionel
Peyre Lavigne Andre
Collopy Daniel R.
Dover Rennie William
Fourson George R.
Motorola Inc.
Woliln Harry A.
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