Method for forming a semiconductor device using optical...

Details Method for forming a semiconductor device using optical... Method for forming a semiconductor device using optical...

2011-06-14

2011-06-14

Rossoshek, Helen (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Manufacturing optimizations

C716S050000, C716S051000, C716S052000, C716S053000, C716S055000, C382S145000, C382S279000

Reexamination Certificate

active

07962868

ABSTRACT:
A method for forming a semiconductor device includes performing a first optimization of a first edge location of a feature fragment, wherein the first optimization has a first speed per fragment, and performing a second optimization of a second edge location of the feature fragment, wherein the second optimization has a second speed per fragment that is slower than the first speed per fragment. Next, a result of the second optimization is used to form a reticle pattern; and a layer on a semiconductor wafer is patterned using the reticle pattern.

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