Method for forming a protective film on a semiconductor body

Details Method for forming a protective film on a semiconductor body Method for forming a protective film on a semiconductor body

1984-05-16

1986-12-09

Bernstein, Hiram H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156DIG86, B05D 306

Patent

active

046279911

ABSTRACT:
In the representative embodiment of the invention described in the specification, a boron coating is applied to a semiconductor body having a protective film of a compound of the semiconductor material by heating the semiconductor body to a temperature below 400.degree. C. in a vacuum chamber, introducing diborane gas into the chamber and causing a glow discharge between two electrodes in the chamber.

REFERENCES:
patent: 4362766 (1982-12-01), Dannhauser et al.
patent: 4365107 (1982-12-01), Yamauchi
patent: 4436762 (1984-03-01), Lapatovich et al.
patent: 4438183 (1984-03-01), Baughman et al.
Ellipsometric Investigations of Boron-Rich Layers on Silicon, Busen et al, J. Electrochem. Soc. Solid State Sci., Mar. 1968, 291-299.

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