Method for forming a protecting film on side walls of a semicond

Details Method for forming a protecting film on side walls of a semicond Method for forming a protecting film on side walls of a semicond

1981-01-07

1982-10-26

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

204192P, 427 431, B05D 306, C23C 1700

Patent

active

043562108

ABSTRACT:
A method for forming a protecting film on the side walls of a semiconductor device having an exposed PN junction at the side walls, e.g. a semiconductor laser, involves placing the device on a substrate target made of a protecting film material. Energetic particles are impinged against the substrate target. Particles of the material are emitted from the substrate target and deposited on only the side walls to form the protecting film.

REFERENCES:
patent: 3519788 (1970-07-01), Hatzakis
patent: 3846294 (1974-11-01), Vossen
patent: 4172907 (1979-10-01), Mones et al.
Ladany et al., "App. Phys. Lett." vol. 30, No. 2, pp. 87-88, 1977.
Shima et al., "App. Phys. Lett." vol. 31, No. 9, pp. 625-627, 1977.
Barnes et al., "J. App. Phys." vol. 49, No. 5, pp. 2981-2982.

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