Method for forming a plane structure

Details Method for forming a plane structure Method for forming a plane structure

2006-09-05

2006-09-05

Nguyen, Thanh (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

C438S745000, C438S725000

Reexamination Certificate

active

07101796

ABSTRACT:
A method for forming a plane structure. It comprises the following steps: forms a liquid material with a thicker thickness on a substrate, rotating both the liquid material and the substrate around the axis of the substrate, applying a solvent on the rotating liquid material to remove partial liquid material. It also comprises the following steps: form a thicker removable material on a substrate, and partially remove the surface part of the removable material.

REFERENCES:
patent: 5244839 (1993-09-01), Baker et al.
patent: 5473187 (1995-12-01), Baker et al.
patent: 5569614 (1996-10-01), Kataoka et al.
patent: 5753940 (1998-05-01), Komoto
patent: 6020639 (2000-02-01), Ulrich et al.
patent: 6245640 (2001-06-01), Claussen et al.
patent: 6406994 (2002-06-01), Ang et al.
patent: 2001/0054735 (2001-12-01), Nagai
patent: 2002/0132393 (2002-09-01), Kraxenberger et al.
patent: 2005/0178401 (2005-08-01), Boyers

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