Method for forming a photoresist pattern

Details Method for forming a photoresist pattern Method for forming a photoresist pattern

2007-01-04

2008-12-23

Del Cotto, Gregory R (Department: 1796)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C510S176000, C510S500000

Reexamination Certificate

active

07467632

ABSTRACT:
A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2O and an ionic surfactant represented by Formula 1, and a method for forming a photoresist pattern using the same. By spraying the cleaning solution of the present invention over photoresist film before and/or after exposing step, pattern formation in an undesired region caused by ghost images can be removed.

REFERENCES:
patent: 5534396 (1996-07-01), McGuckin et al.
patent: 6537957 (2003-03-01), Cardola et al.
patent: WO 00/12661 (2000-03-01), None

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