Method for forming a photoresist-laminated substrate, method...

Coating processes – Spray coating utilizing flame or plasma heat – Metal or metal alloy coating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S455000, C427S457000, C427S475000, C427S180000, C427S203000, C427S405000, C427S427000

Reexamination Certificate

active

08003173

ABSTRACT:
The present invention relates to a method for forming a photoresist-laminated substrate including: preparing a laminated substrate having an insulating substrate and a metal layer; coating with an aerosol of metal nanoparticles on the metal layer; laminating a photoresist film on the metal layer coated with the aerosol of metal nanoparticles. The method of the present invention is a environmentally friendly method since an aerosol of metal nanoparticles is used, differentiated from the conventional wet process.

REFERENCES:
patent: 4424408 (1984-01-01), Elarde
patent: 5302414 (1994-04-01), Alkhimov et al.
patent: 5964395 (1999-10-01), Glovatsky et al.
patent: 6640434 (2003-11-01), Wojewnik et al.
patent: 2001/0004473 (2001-06-01), Strutt et al.
patent: 2003/0190799 (2003-10-01), Kung et al.
patent: 2005/0074597 (2005-04-01), Grinberg et al.
patent: 08-111474 (1996-04-01), None
patent: 09-148714 (1997-06-01), None
patent: 2000-261144 (2000-09-01), None
patent: 2004-200557 (2004-07-01), None
patent: 2004-342831 (2004-12-01), None
patent: 2006-049923 (2006-02-01), None
patent: 2006-210896 (2006-08-01), None
patent: 10-2005-0063689 (2005-06-01), None
patent: 10-2005-0107489 (2005-11-01), None
Japanese Office Action, w/ partial English translation thereof, issued in Japanese Patent Application No. JP 2008-055050 dated Jun. 8, 2010.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming a photoresist-laminated substrate, method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a photoresist-laminated substrate, method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a photoresist-laminated substrate, method... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2777118

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.