Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-06-27
1995-12-05
Chapman, Mark A.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430309, 430320, 430325, 430329, G03F 900
Patent
active
054728126
ABSTRACT:
A silicon film is formed on the surface of a substrate for a photomask, and a silicon nitride film is formed thereon. Then the silicon film and the silicon nitride film are patterned into desired shapes by photolithography method, the edge portion of the patterned silicon film is oxidized to provide a translucent region consisting of a silicon oxide film only on the edge portion, and the silicon nitride film is removed.
REFERENCES:
patent: 4377627 (1983-03-01), Vinton
R. A. Dellaguardia, et al., "X-ray Transmission Through Low Atomic Number Particles", IBM Research Division, 8226 Microelectronic Engineering, vol. 9, No. 1-4, pp. 139-142 (May 9, 1989).
Marc D. Levenson, et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, pp. 1828-1836 (Dec. 1982).
S. M. Sze, VLSI Technology, pp. 465-467 (1983).
Canon Kabushiki Kaisha
Chapman Mark A.
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