Method for forming a photomask

Details Method for forming a photomask Method for forming a photomask

1998-11-20

2000-01-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060156422

ABSTRACT:
A fabrication process for a multi-layer photomask. A transparent substrate is provided. An anti-reflecting layer is formed on the substrate. First blinding blocks are formed on the anti-reflecting layer by defining a first blinding layer. A transparent layer is formed along the profile of the structure surface described above. Second blinding blocks are formed on the transparent layer between the first blinding blocks by defining a second blinding layer, wherein a part of the transparent layer on the first blocks is exposed.

REFERENCES:
patent: 5422206 (1995-06-01), Kamon

Affiliated with

Also associated with

Rating

Method for forming a photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-561711