Method for forming a patterned mask

Details Method for forming a patterned mask Method for forming a patterned mask

1993-07-26

1994-03-01

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427 96, 427273, 4273855, 427386, 427510, 427555, 427557, 427558, B05D 306

Patent

active

052906086

ABSTRACT:
A patterned mask is provided on a surface by formulating a liquid, 100% solids-type thermally curable mask composition, applying the composition as a film to the surface, selectively thermally exposing the film in the desired mask pattern using a focused beam of heat energy without use of an interposed patterned mask, and then developing away the film areas not thermally exposed so as to produce a patterned mask. The invention enables the elimination of potentially troublesome volatile solvent carriers or diluents from the composition, while at the same time still enabling production of finely-defined patterns without having to bring a patterned mask (cf. phototool) into contact with the composition. Similarly, the expense involved with use of dry film photo-sensitive masks is avoided.

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