Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Patent
1993-07-28
1996-04-30
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Polymerization of coating utilizing direct application of...
427503, 427504, 427510, 427512, 427515, 427534, 427552, 427553, 427555, 427264, 427265, 4274071, 4274301, 216 94, 216 65, 216 66, 1566431, B05D 306, B05D 118, C08J 704, C08J 718
Patent
active
055123287
ABSTRACT:
In forming a thin film pattern, first a seed material film is formed on a substrate and then exposed using electron beam lithography, for example, in the shape of the pattern. The latent image is then removed and an oriented material is deposited on one of the seed material and the substrtate, which have different hydrophilicity properties, to form the pattern. The oriented film is formed by an LB film forming method, in one example, and in another example the LB film material is a cresol novolak resin having a proportion of p-cresol novolak to m-cresol novolak of at least 20%.
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Miura Naoko
Okazaki Shinji
Shiraishi Hiroshi
Toriumi Minoru
Yoshimura Toshiyuki
Hitachi , Ltd.
Padgett Marianne
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