Method for forming a multi-layer deposited film

Details Method for forming a multi-layer deposited film Method for forming a multi-layer deposited film

1987-01-12

1989-04-25

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427255, 4272557, 437225, C23C 1622

Patent

active

048246972

ABSTRACT:
A method for forming a deposited film by introducing the active species (A) formed by decomposition of a subjective starting material gas (A) which is the major flow rate component and the active species (B) formed by decomposition of an objective starting material gas (B) which is the minor flow rate component and the activated species (C) formed from a compound (C) separately from each other into a film forming space for formation of a deposited film on a substrate and permitting said active species (A) and active species (B) to chemically react with said activated species (C) to thereby form a deposited film on the substrate comprises forming a multi-layer structure film by varying the amount of said active species (B) introduced into the film forming space.

REFERENCES:
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4504518 (1985-03-01), Ovshinsky et al.
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4523544 (1985-06-01), Harada et al.
patent: 4568626 (1986-02-01), Ogawa
patent: 4637895 (1987-01-01), Ovshinsky et al.
patent: 4657777 (1987-04-01), Hirooka et al.
patent: 4664937 (1987-05-01), Ovshinsky et al.

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