Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Patent
1998-11-13
2000-11-28
Bowers, Charles
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
257436, H01L 2100
Patent
active
061534463
ABSTRACT:
A method for forming a metallic reflecting layer in a semiconductor photodiode including a CMOS photodiode to enhance the sensitivity by filling a trench formed in the isolation next to the depletion region of the semiconductor photodiode with high reflectivity metal. The metal filled in the trench is used as a metallic reflecting layer to increase the number of photons reaching the depletion region by reflecting part of the aslope incident photons. An insulator is formed on the top of the metallic reflecting layer to electrically insulate the metallic reflecting layer from other conducting device formed by the follow-up process.
REFERENCES:
patent: 5721429 (1998-02-01), Radford et al.
Chen Ming-I
Fan Yung-Chieh
Bowers Charles
Christianson Keith
United Microelectronics Corp.
Wu Charles C. H.
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