Method for forming a metal wire of a semiconductor device

Details Method for forming a metal wire of a semiconductor device Method for forming a metal wire of a semiconductor device

1995-02-15

1995-11-14

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437245, 148DIG102, 148DIG106, H01L 213205

Patent

active

054666406

ABSTRACT:
The object of the present invention is to prevent the electrical short between the adjacent metal wires by forming metal wires alternately between insulation films and to improve the process margin in the lithography process and the etching process.
The present invention alternately forms a plurality of metal wires between the insulation films by manufacturing the photomask for metal wires in two separate pieces to correspond to the photomask for general metal wires for forming a plurality of metal wires which are densely constituted, and by utilizing the two photomasks.

REFERENCES:
patent: 4484978 (1984-11-01), Keyser
patent: 4996133 (1991-02-01), Brighton et al.
patent: 5420078 (1995-05-01), Sikora

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