Method for forming a metal film on a substrate

Details Method for forming a metal film on a substrate Method for forming a metal film on a substrate

1986-12-16

1989-07-04

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427252, 427253, 427255, 4272551, C23C 1606, C23C 1608, C23C 1616

Patent

active

048449504

ABSTRACT:
A method for forming a deposited film comprises introducing into a reaction space a gasifiable starting material containing a transition metal element for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidation action for said starting material to effect contact therebetween to thereby chemically form a plural number of precursors including precursors under excited state, and forming a metal deposited film on a substrate existing in the film forming space with the use of at least one precursor of these precursors as the feeding source for the constituent element of the deposited film.

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