Method for forming a mark with pivoting of a nozzle about...

Details Method for forming a mark with pivoting of a nozzle about... Method for forming a mark with pivoting of a nozzle about...

2006-10-26

2009-10-20

Cleveland, Michael (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S457000, C427S541000, C427S553000, C427S554000, C427S555000, C427S557000, C427S256000, C118S641000, C118S642000, C347S020000, C347S037000, C347S038000, C347S039000, C347S051000

Reexamination Certificate

active

07604848

ABSTRACT:
A method for forming a mark includes ejecting a droplet of a liquid from a nozzle onto an ejection target position on a surface of an object along an ejecting direction; radiating a laser beam from a radiation port onto the ejection target position along a radiating direction; and pivoting the nozzle and the radiation port together about the ejection target position as a pivot center, thereby changing the angle between a normal line of the surface of the object and the ejecting direction and the angle between the normal line and the radiating direction while maintaining the angle between the ejecting direction and the radiating direction.

REFERENCES:
patent: 4553147 (1985-11-01), Slettenmark
patent: 7059705 (2006-06-01), Iwata
patent: 7156515 (2007-01-01), Iwata
patent: 2004/0016456 (2004-01-01), Murozono et al.
patent: 2004/0226929 (2004-11-01), Miura et al.
patent: 2007/0097198 (2007-05-01), Iwata
patent: 03292145 (1991-12-01), None
patent: 11-077340 (1999-03-01), None
patent: 2003-127537 (2003-05-01), None
patent: 2005-095849 (2005-04-01), None
English Abstract of KR20040065151 dated Jul. 2004.
English Abstract of KR20040041016 dated May 2004.

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