Coating processes – Magnetic base or coating – Magnetic coating
Patent
1978-08-28
1980-02-26
Pianalto, Bernard D.
Coating processes
Magnetic base or coating
Magnetic coating
427128, H01F 1002
Patent
active
041906837
ABSTRACT:
A method of forming an improved liquid phase epitaxial film on a wafer. The resultant film has improved uniformity of magnetic properties, such as the collapse field (H.sub.o), across the surface of the wafer as well as being substantially free of mesa defects on the surface. The method includes the step of growing the liquid phase epitaxial film while the wafer is in the horizontal plane. The wafer is removed from the melt while the wafer is tilted at an angle from the horizontal plane so that the melt may drain from the wafer. Then the wafer is positioned in a horizontal plane again and rotated to remove the remaining melt droplets from the edge of the wafer. In a preferred embodiment, a plurality of wafers are positioned in a wafer holding means so that the wafers are arranged in a stacked manner having substantially the same space between adjacent wafers. Wafers may also be stacked in pairs that are back-to-back while carrying out this method.
REFERENCES:
patent: 2913246 (1959-11-01), Hagopian
patent: 3198657 (1965-08-01), Kimball et al.
patent: 3486937 (1969-12-01), Linares
patent: 3705048 (1972-12-01), Staunton
patent: 3730760 (1973-05-01), Machmiller
Davies John E.
Galli Guido
International Business Machines - Corporation
Kieninger Joseph E.
Pianalto Bernard D.
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