Etching a substrate: processes – Forming or treating article containing a liquid crystal...
Reexamination Certificate
2006-06-13
2006-06-13
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Forming or treating article containing a liquid crystal...
C216S013000, C216S041000, C438S030000
Reexamination Certificate
active
07060195
ABSTRACT:
A plurality of scan lines and gate electrodes are formed on a pixel array area of a substrate, and a plurality of bottom pad electrodes are formed on a gate and a source pad area of the substrate. An insulating layer and a plurality of active layers are formed on the substrate. A plurality of signal lines, source/drain electrodes are formed on the pixel array area, and a plurality of top pad electrodes are formed on the gate and the source pad area. A circuit testing process is performed. A passivation layer having via holes is formed on the pixel array area, and a plurality of contact holes are formed in the gate and the source pad area. A patterned transparent conductive layer filling the via holes and the contact holes is formed on the substrate.
REFERENCES:
patent: 5828433 (1998-10-01), Shin
patent: 5982467 (1999-11-01), Lee
patent: 6184948 (2001-02-01), Lee
patent: 6400425 (2002-06-01), Kim et al.
patent: 2002/0041347 (2002-04-01), Lee et al.
Alanko Anita
Hsu Winston
Quanta Display Inc.
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