Etching a substrate: processes – Forming or treating thermal ink jet article
Patent
1998-01-12
2000-07-04
Gulakowski, Randy
Etching a substrate: processes
Forming or treating thermal ink jet article
216 56, 216 65, 347 47, 21912171, G01D 1518
Patent
active
060834110
ABSTRACT:
A method of forming adjacent ink and dilution solution nozzles in an orifice plate includes first providing an orifice plate having a thickness dimension. A first nozzle is then formed having a first orifice extending through the orifice plate at a first angular orientation that is generally normal to the thickness dimension. A second nozzle is then formed having a second orifice adjacent to the first orifice and at a second different angular orientation. One of the first and second nozzles is the ink nozzle and the other of the first and second nozzles is the dilution solution nozzle. The first and second nozzles are formed by laser light irradiation.
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Ando Makoto
Kishima Koichiro
Murakami Takaaki
Nakayama Tetsuo
Gulakowski Randy
Olsen Allan
Sony Corporation
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