Method for forming a headless resistor utilizing selective diffu

Details Method for forming a headless resistor utilizing selective diffu Method for forming a headless resistor utilizing selective diffu

1980-12-15

1982-06-01

Rutledge, L. Dewayne

Metal working

Method of mechanical manufacture

Assembling or joining

29590, 29591, 148187, 357 15, 357 20, 357 51, 427 84, H01L 21283, H01L 2138

Patent

active

043320708

ABSTRACT:
A diffused resistor included in a Schottky device formed in a planar semiconductor material comprises a resistor diffusion formed in the surface of the material and a contact diffusion formed in the surface of the material, the configuration of the contact diffusion being essentially coincident with the shape of the resistor at the location at which ohmic contact to the resistor diffusion is made.

REFERENCES:
patent: 3506893 (1970-04-01), Dhaka
patent: 3615932 (1971-10-01), Makimoto et al.
patent: 3683306 (1972-08-01), Bulthuis et al.
patent: 3860465 (1975-01-01), Matzner et al.
patent: 3879236 (1975-04-01), Langdon
patent: 3962590 (1976-06-01), Kane et al.
patent: 4034395 (1977-07-01), Abdelrahman
Gates, H. R., "Semiconductor Resistor", I.B.M. Tech. Discl. Bull., vol. 8, No. 12, May 1966, pp. 1849-1850.

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