Method for forming a film with plasma CVD process

Details Method for forming a film with plasma CVD process Method for forming a film with plasma CVD process

1992-07-14

1994-04-12

Beck, Shrive

Coating processes

Magnetic base or coating

Magnetic coating

427569, 427132, 427249, 427577, C23C 1600

Patent

active

053024249

ABSTRACT:
In plasma discharge to form a film on a magnetic tape of the like in a plasma CVD process, a hollow electrode 12 is arranged in a discharge tube 8 or arranged opposed to another electrode 34. A non-polymerizable gas is blown out from the inside of the hollow electrode 12 made from a sintered alloy, and impurities do not adhere to the electrode. Then, small traces of discharge are not generated on the magnetic tape and impurities do not contaminate the magnetic tape, so that a uniform thin film of high quality is manufactured at a high rate in an industrial scale.

REFERENCES:
patent: 4555464 (1985-11-01), Kido et al.
patent: 5182132 (1993-01-01), Murai et al.

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