Coating processes – Coating by vapor – gas – or smoke
Patent
1994-10-18
1995-10-17
King, Roy V.
Coating processes
Coating by vapor, gas, or smoke
4272551, 4272552, 427572, 427573, 427574, 427575, 427569, 427570, 427596, 437 67, 437919, 148DIG50, C23C 1600, B05D 306
Patent
active
054589193
ABSTRACT:
A thin film forming method which comprises the steps of supporting a substrate to be treated, having a trench or an unevenness thereon, in a reaction vessel; introducing a reactive gas into the reaction vessel; activating the reactive gas to form a deposit species, the deposit species characterized by a phase diagram including a liquid phase region defined by a melting curve and an evaporation curve that intersect at a triple point; and forming a thin film containing at least a part of the deposit species on the substrate while retaining a pressure in the reaction vessel higher than the triple point of the phase diagram of the deposit species, and retaining a temperature of the substrate within the liquid phase region of the phase diagram of the deposit species.
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S. Noguchi, H. Okano and Y. Horiike, "Liquid Phase Oxidation Employing O Atoms Produced by Microwave Discharge and Si(CH.sub.3).sub.4 ", Extended Abstracts of the 19th Conf. on Solid State Devices and Materials, pp. 451-454, 1987.
J. Sato and K. Maeda, "Very Low Temperature CVD of SiO.sub.2 Films Using Ozone and Organosilane", Extended Abstracts of Dielectrics and Insulation Division of the Electrochemical Society, pp. 31-33, 1971.
Noguchi Sadahisa
Okano Haruo
Kabushiki Kaisha Toshiba
King Roy V.
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