Method for forming a film on a substrate

Details Method for forming a film on a substrate Method for forming a film on a substrate

2011-03-22

2011-03-22

Cameron, Erma (Department: 1715)

Coating processes

With post-treatment of coating or coating material

Heating or drying

C427S385500, C427S387000

Reexamination Certificate

active

07910168

ABSTRACT:
A method for forming a film on a substrate includes steps of: blending precursor, dissolvent, de-ionized water and catalyst in proportion to make sol solution; standing the sol solution for a period of to form gel solution; mixing the gel solution with diluent in proportion to form the coating solution; and coating the coating solution onto the substrate and then drying the coating solution to form a film on the substrate. The ratio of the gel solution and the diluent in the coating solution can be controlled to change the thickness of the film formed on the substrate. The ratio of the gel solution and the diluent is adjusted, the thickness of the film is adjusted according to the ratio to realize controlling the thickness of the film, therefore, the method for forming the film on the substrate is simply, and the thickness of the film can be controlled exactly, so the method can be used in industry field.

REFERENCES:
patent: 2004/0201014 (2004-10-01), Yagihashi et al.
patent: 2007/0196427 (2007-08-01), Jokinen et al.
Fardad et al, Journal of Non-Crystalline Solids, 183, pp. 260-267, 1995.
Raman et al, Journal of Membrane Science, 105, pp. 273-279, 1995.
Cao et al, Advanced Materials, 8(7), pp. 588-591, 1996.

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