Method for forming a film coat on the inside of a depression

Details Method for forming a film coat on the inside of a depression Method for forming a film coat on the inside of a depression

1987-12-24

1989-08-29

Beck, Shrive

Coating processes

Electrical product produced

Welding electrode

427 531, 437228, 156625, B05D 306

Patent

active

048616222

ABSTRACT:
An improved method for depositing material on a substrate is shown. The material to be deposited is energized by irradiation with light in a chamber in which a CVD method is carried out. The energy induced by the irradiation remains in the molecules of the material even after the molecules have lain on the substrate. With the residual energy, the molecules can wander on the substrate even to a hidden surface. Due to this wandering, the deposition can be performed also on the inside of a deep cave. A semiconductor device is thereafter formed on the inside of the cave.

REFERENCES:
patent: 4690729 (1987-09-01), Douglas
patent: 4695479 (1987-09-01), Nakakura
patent: 4711699 (1987-12-01), Amano
patent: 4724159 (1988-02-01), Yamazaki
patent: 4735821 (1988-04-01), Yamazaki

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