Method for forming a film by spin coating

Details Method for forming a film by spin coating Method for forming a film by spin coating

2006-02-28

2010-06-22

Jolley, Kirsten C (Department: 1792)

Coating processes

Centrifugal force utilized

C427S335000, C427S425000, C118S052000, C118S320000

Reexamination Certificate

active

07740908

ABSTRACT:
It is an object of the present invention to provide a method for producing a solid substrate used for sensors having a film with a small film thickness distribution, and a solid surface used for sensors having a film with a small film thickness distribution. The present invention provides a method for producing a solid substrate for sensors that has a coating on the surface using spin coating, wherein a substrate to be coated is rotated in an atmosphere in which the vapor pressure of coating solvent is 50% to 100% with respect to the saturation vapor pressure so as to form a thin film of a coating solution on said substrate to be coated.

REFERENCES:
patent: 4347302 (1982-08-01), Gotman
patent: 5472502 (1995-12-01), Batchelder
patent: 6027760 (2000-02-01), Gurer et al.
patent: 7030039 (2006-04-01), Gurer et al.
patent: 2005/0147748 (2005-07-01), Nguyen
patent: 2005/0170354 (2005-08-01), Munch-Fals
patent: 3231970 (1996-08-01), None
patent: 2942213 (1998-03-01), None
patent: 3352371 (1999-05-01), None
patent: 3273754 (1999-07-01), None

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