Method for forming a ferroelectric material film by the sol-gel

Semiconductor device manufacturing: process – Making passive device – Stacked capacitor

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438781, 438785, 4274195, H01L 218242

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058406158

ABSTRACT:
A method for forming a ferroelectric material film, more particularly a lead zirconate titanate (PZT) film by the sol-gel method wherein a lowered oxidative sintering temperature may be adopted in preparing the ferroelectric material film with a perovskite crystalline structure, thereby reducing the risk of oxidation of metal electrodes and other circuits when the ferroelectric material film is employed as a dielectric in semiconductor devices, such as in a capacitor, for example. The method contemplates the preparation of a raw material solution containing an organometallic compound of a metallic element forming the ferroelectric material film, alkanolamine and/or stabilizer comprising a .beta.-diketone, with the concentration of the stabilizer being sufficient to provide a mole ratio to the total metal atoms of (stabilizer/total metal atoms)>3. The method then involves coating the raw material solution, drying the coated raw material solution to form a dried film, and sintering the dried film to form the ferroelectric material film wherein the oxidative sintering is carried out at a relatively low temperature of about 450.degree. C. in forming the ferroelectric material film with a perovskite crystalline structure.

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N. Tohge, et al., J. Am. Ceram. Soc., 74(1) (1991) 67, "Preparation of PbZrO3-PbTiO3 Ferroelectric Thin Films by the Sol-Gel Process".
Translation of JP 3-83817, Apr. 1991.
Miyazawa et al., "Microstructural Characterization of Gel-Derived Thin Films" Ceram. Trans. (1993) 30 (Nucleation & Crystallization in Liquids) pp. 331-334.

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