Etching a substrate: processes – Forming or treating article containing a liquid crystal...
Patent
1995-07-17
1997-03-18
Powell, William
Etching a substrate: processes
Forming or treating article containing a liquid crystal...
216 24, 216 38, 216 39, B44C 122
Patent
active
056119410
ABSTRACT:
A method for forming a spatial light modulator (SLM) comprises forming a substrate (10) underneath a layer of Ferro-Electric crystal material (14) with a plurality of mirrored elements (12) disposed on the surface thereof. The process involves forming a layer of low stress oxide on the surface of the substrate over control pads or conductive strips (24) which are connected to underlying control elements. Openings (30) are formed in the oxide, followed by a formation of a conformal layer of aluminum (32). This is etched to form plugs (36) and then the substrate is subjected to a chemical/mechanical planarization step. This involves polishing the substrate to provide an optically flat surface. Thereafter, a layer of aluminum is then disposed on the surface of the substrate, patterned and etched to form the mirrored elements (12).
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Howison Gregory M.
Powell William
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