Coating processes – Electrical product produced – Condenser or capacitor
Patent
1997-03-05
1998-07-21
King, Roy V.
Coating processes
Electrical product produced
Condenser or capacitor
427 79, 4272481, 4272557, 4274193, B05D 512
Patent
active
057832536
ABSTRACT:
The present invention provides a method of forming a high strength dielectric film which provides a high dielectric constant for a high density device, and a method of fabricating a capacitor using such a method. The method includes a two step process where one of the steps provides a composition BST layer serving as a nucleation layer. For example, a BST layer having a composition of Ba.sub.x Sr.sub.1-x TiO.sub.3, where X has a range of about 0 to 0.4. Another BST layer having a composition of Ba.sub.x Sr.sub.1-x TiO.sub.3 is provided, where X is about 0.5. Such a method provides a high dielectric film with a very smooth surface, compared to conventional methods.
REFERENCES:
patent: 5383088 (1995-01-01), Chapple-Sokol et al.
patent: 5626906 (1997-05-01), Summer et al.
patent: 5635741 (1997-06-01), Tsu et al.
Yuuki, A., et al., "Novel Stacked Capacitor Technology for I Gbit DRAMs with CVD-(Ba,Sr)TiO.sub.3 Thin Films on a Thick Storage Node of Ru," IEDM-95-115, pp. 5.2.1--5.2.4, 1995.
King Roy V.
LG Semicon Co. Ltd.
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