Method for forming a diamond coated field emitter and device pro

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With a step of measuring – testing – or sensing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117 95, 117103, 117929, 427577, C30B 2904

Patent

active

055803806

ABSTRACT:
A method for making a field emitter comprising the steps of providing a projection; electrically biasing the projection; and exposing the electrically biased projection to a hydrocarbon containing plasma to form a layer of diamond nuclei on the projection. The diamond nuclei are relatively inert and have a high nucleation density. The projection is preferably a material capable of forming a carbide, such as (111) oriented silicon. Refractory metals may also be used for the projection. The electrical biasing is preferably at a voltage in a range of about -150 to -250 volts. The hydrocarbon containing plasma preferably comprises a plasma including about 2 to 5% by weight of methane in hydrogen. An intervening carbide layer is preferably formed at a surface of the projection and underlying the layer of diamond nuclei. The field emitter produced by the method and having a relatively high diamond nucleation density is also disclosed.

REFERENCES:
patent: 3998678 (1976-12-01), Fukase et al.
patent: 4168213 (1979-09-01), Hoeberechts
patent: 5126287 (1992-06-01), Jones
patent: 5129850 (1992-07-01), Kane et al.
patent: 5138237 (1992-08-01), Kane et al.
patent: 5141460 (1992-08-01), Jaskie et al.
patent: 5199918 (1993-04-01), Kumar
patent: 5203731 (1993-04-01), Zimmerman
patent: 5258685 (1993-11-01), Jaskie et al.
patent: 5283501 (1994-02-01), Zhu et al.
patent: 5285089 (1994-02-01), Das
patent: 5290610 (1994-03-01), Kane et al.
patent: 5410166 (1995-04-01), Kennel
patent: 5449970 (1995-09-01), Kumor et al.
Wolter et al, "Textured Growth of Diamond on Silicon via In Situ Carburization and Bias-enhanced Nucleation", Applied Physics Letters 62(11) pp. 1215-1217 1993.
Geis, et al., Diamond Cold Cathodes, Elsevier Science Publishers B. V., 1991, pp. 309-310.
Liu, et al., Diamond Thin Film Coated Si Field Emitters, NCSU Research Adm., Sep. 2, 1994, pp. 8-11.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming a diamond coated field emitter and device pro does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a diamond coated field emitter and device pro, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a diamond coated field emitter and device pro will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-782034

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.