Method for forming a deposited layer on a skirted substrate

Details Method for forming a deposited layer on a skirted substrate Method for forming a deposited layer on a skirted substrate

1989-12-08

1991-04-23

Lawrence, Evan

Coating processes

Interior of hollow article coating

Spraying

427 69, 427166, 427237, 427238, 427255, 4272555, 427282, B05D 722, C23C 1604

Patent

active

050099302

ABSTRACT:
A method whereby the thickness distribution of a vapor deposited layer, such as an interference filter deposited on a skirted substrate such as a glass faceplate for a projection television tube, is improved by shielding the substrate from indirect flux of vapor so as to reduce the shadowing effect of the skirt upon the thickness distribution of the deposited layer, thereby improving the white field uniformity of the resultant projection image.

REFERENCES:
patent: 4380212 (1983-04-01), Kraus

Affiliated with

Also associated with

Rating

Method for forming a deposited layer on a skirted substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a deposited layer on a skirted substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a deposited layer on a skirted substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1620589