Method for forming a deposited film from a gaseous silane compou

Details Method for forming a deposited film from a gaseous silane compou Method for forming a deposited film from a gaseous silane compou

1986-12-22

1989-05-16

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

427255, 4272552, 437225, C23C 1622

Patent

active

048308900

ABSTRACT:
A process for forming a deposited film which comprises introducing a linear, branched or cyclic gaseous silane compound represented by a general formula:

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