Method for forming a deposited film

Details Method for forming a deposited film Method for forming a deposited film

1986-10-17

1989-06-06

Childs, Sadie

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 70, 427255, 4272553, 437225, 437233, 437234, B05D 506, B05D 512

Patent

active

048370487

ABSTRACT:
A deposited film is formed by introducing a gaseous starting material, a gaseous halogenic oxidizing agent and at least one oxygen or nitrogen type oxidizing agent into a reaction space to form excited precursors and thereafter forming a deposited film on a substrate in a film forming space employing the excited precursors. If desired, a gaseous material containing a component for valence electron control can be added to the reaction space.

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