Method for forming a copper metal wiring with aluminum containin

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437190, 437194, 437198, H01L 2128

Patent

active

055479014

ABSTRACT:
A method for forming a metal wiring of a semiconductor element, which uses an aluminum film as an oxidation prevention film to prevent oxygen from being diffused into copper contained in the metal wiring. An aluminum oxidation prevention film layer is selectively formed on an exposed surface of the copper metal wiring layer using a selective chemical vapor deposition method. The width of the aluminum layer formed is below 100.ANG., and is converted into Al.sub.2 O.sub.3 at heat treating or under an atmosphere, thereby preventing the copper from oxidation. A diffusion prevention film between the substrate and the copper metal wiring layer is further included for preventing the copper from diffusing into the substrate.

REFERENCES:
patent: 4742014 (1988-05-01), Hooper et al.
patent: 4931410 (1990-06-01), Tokunaga et al.
patent: 5098516 (1992-03-01), Norman et al.
patent: 5273775 (1993-12-01), Dyer et al.
patent: 5312774 (1994-05-01), Nakamura et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5354712 (1994-10-01), Ho et al.
patent: 5447599 (1995-09-01), Li et al.
patent: 5470789 (1995-11-01), Misawa

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming a copper metal wiring with aluminum containin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a copper metal wiring with aluminum containin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a copper metal wiring with aluminum containin will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2330524

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.