Method for formation of a self-aligned N-well for isolated field

Electric lamp or space discharge component or device manufacturi – Process – Electrode making

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438 20, H01J 902

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active

059116153

ABSTRACT:
A method for use in manufacture of field emitter devices is provided specifically for forming electron emitter tips in a doped semiconductor substrate. The method comprises the following steps: forming a depression around an emitter area in the substrate; doping the substrate in the depression; and expanding the dopant in the depression into the emitter area.

REFERENCES:
patent: 4008412 (1977-02-01), Yuito et al.
patent: 5089292 (1992-02-01), MaCaulay et al.
patent: 5188977 (1993-02-01), Stengl et al.
patent: 5229331 (1993-07-01), Doan et al.
patent: 5358908 (1994-10-01), Reinberg et al.
patent: 5401676 (1995-03-01), Lee
patent: 5572041 (1996-11-01), Betsui et al.
patent: 5670788 (1997-09-01), Geis
patent: 5721472 (1998-02-01), Browning et al.

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