Method for focusing patterning nano-sized structure

Details Method for focusing patterning nano-sized structure Method for focusing patterning nano-sized structure

2006-02-01

2009-08-25

Parker, Frederick J (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Electrostatic charge, field, or force utilized

C427S468000, C427S469000

Reexamination Certificate

active

07579050

ABSTRACT:
A nano-structure can be focus-patterned while minimizing the generation of a noise pattern by the inventive method which comprises the steps of: (i) mounting a plate having a nano-scale pattern formed thereon by a patterned photoresist layer on an electrode placed in an externally grounded reactor and applying a voltage to the electrode; (ii) accumulating charges selectively onto the photoresist layer on the plate mounted on the electrode; and (iii) introducing charged nanoparticle aerosol into the reactor and guiding the migration of the charged nanoparticles to the uncharged nano-scale pattern region on the plate mounted on the electrode to guide the nanoparticles to adhere to the center region of the pattern.

REFERENCES:
patent: 2003/0102444 (2003-06-01), Deppert et al.
patent: 2006/0093749 (2006-05-01), Kim et al.
patent: 2006/0093750 (2006-05-01), Han et al.

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