Method for fine patterning

Details Method for fine patterning Method for fine patterning

1989-08-02

1992-02-04

Kunemund, Robert

Fishing, trapping, and vermin destroying

437187, 437192, 437229, 437944, H01L 21283, H01L 21312, H01L 213205

Patent

active

050860135

ABSTRACT:
A lift-off method for fine patterning includes the steps of: applying a photoresist layer to a substrate; implanting ions into predetermined regions in a surface layer of the photoresist layer; irradiating the photoresist layer with ultraviolet from above; developing the photoresist layer to form a resist pattern for lift-off; depositing a desired material with a predetermined thickness from above the resist pattern; and removing the resist pattern, thereby lifting off the material on the resist pattern, whereby a fine pattern of the desired material is left on the substrate.

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