Method for finding a reference point

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364559, 36472912, 250561, 356400, 358101, 382 8, G01N 2186, G01B 1100, G06F 1531

Patent

active

050200062

ABSTRACT:
A method for locating the signal from a fiducial mark which is separated by a known distance from a second fiducial mark is disclosed. The signals from the fiducial marks are presumed to be corrupted by noise. The method utilizes the known spacing of the fiducial marks to construct a filter function which, when convolved with the corrupted signal, produces an enhanced signal having a peak at the location of the fiducial mark.

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Murakami, et al.--Laser Step Alignment for Wafer Stepper--SPIE, vol. 538, Optical Microlitholgraphy IV (1985) pp. 9-16.
G. Owen-Shot Noise Errors in Registration for Electron Lithography, (1986) The Institute of Physics, pp. 2209-2233.
Slonaker, et al.-Enhanced Global Alignment for Production Optical Lithography-Internal Nikon Publication.
Tsen-gong Jum Hsu-Digital Adaptive Matched Filter for Fiducial Mark Registration-(1981, May) Hewlett Packard Journal.

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