Method for failure analysis and system for failure analysis

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S183000, C250S309000

Reexamination Certificate

active

10339356

ABSTRACT:
After completion of an arbitrary device process, an apparatus for micro-sample extraction extracts a part of a wafer as a micro-sample of a size equal to or larger than a repetition pattern with a probe and places the extracted micro-sample to a micro-sample storage, and the micro-sample storage is stored into an apparatus for micro-sample storage. The wafer is subjected to a post process and an observation desired position is determined in response to a failure analysis requirement. After that, the micro-sample is unloaded from the micro-sample storage by an apparatus for additional processing of the micro-sample and is placed onto an observation sample holder. By performing an additional process in the observation desired position, a failure analysis sample is prepared, and analysis information obtained by an apparatus for failure analysis is output.

REFERENCES:
patent: 5153818 (1992-10-01), Mukougawa et al.
patent: 5844416 (1998-12-01), Campbell et al.
patent: 6199059 (2001-03-01), Dahan et al.
patent: 6753538 (2004-06-01), Musil et al.
patent: 2002/0166976 (2002-11-01), Sugaya et al.
patent: 2003/0169060 (2003-09-01), Shinada et al.
patent: 2003/0206027 (2003-11-01), Nozoe et al.
patent: 5-52721 (1993-03-01), None
patent: 07-302826 (1995-11-01), None
patent: 11-265679 (1999-09-01), None
patent: 2000-156393 (2000-06-01), None
Material Research Society, Symposium Proceedings, vol. 480, 1997, pp. 19-27.
Proceedings of the 22nd International Symposium for Testing and Failure Analysis, Nov. 18-22, 1996, pp. 199-205.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for failure analysis and system for failure analysis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for failure analysis and system for failure analysis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for failure analysis and system for failure analysis will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3761620

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.