Method for fabrication solid state radiation imager having impro

Details Method for fabrication solid state radiation imager having impro Method for fabrication solid state radiation imager having impro

1993-09-02

1995-03-28

Wilczewski, Mary

Fishing, trapping, and vermin destroying

437241, 437977, 25037011, H01L 2302, G01T 120

Patent

active

054016681

ABSTRACT:
A method of fabricating a radiation imager with strong structural integrity and adhesion between the scintillator and photosensor array includes the steps of forming a photosensor array on a substrate; depositing a barrier layer over the photosensor array, the barrier layer having an upper surface of silicon nitride; treating the silicon nitride upper surface of the barrier layer to prepare the surface for the deposition of material thereover; and depositing a scintillator material over the treated upper surface of the barrier layer. The silicon nitride upper surface of the barrier layer is typically treated by etching the surface, such as in a reactive ion etch, for a selected amount of time, with less than about 500 .ANG. of material being removed from the surface.

REFERENCES:
patent: 4906850 (1990-03-01), Beerlage
patent: 5153438 (1992-10-01), Kingsley et al.
patent: 5187369 (1993-02-01), Kingsley et al.
patent: 5233181 (1993-08-01), Kwasnick et al.

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