Method for fabrication of lithography mask

Details Method for fabrication of lithography mask Method for fabrication of lithography mask

1994-04-25

1995-10-03

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430313, 430315, 430324, 430394, 430322, G03F 900

Patent

active

054551315

ABSTRACT:
This invention relates to a method for fabrication of masks suitable for improving semiconductor wafers in resolution, which comprises processes for depositing a phases shifting layer and an opaque layer on a transparent substrate, defining an opaque area and a transparent area and removing the opaque layer from the transparent area selectively, forming side wall on the sides of the opaque layer, and removing the exposed phase shifting layer selectively using the side walls and the opaque layer as a mask.

REFERENCES:
patent: 4707218 (1987-11-01), Gianmarco et al.
patent: 5268244 (1993-12-01), Yoo

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