Method for fabricating trench capacitors for large scale...

Electrolysis: processes – compositions used therein – and methods – Electrolytic erosion of a workpiece for shape or surface... – Electrolyte composition or defined electrolyte

Reexamination Certificate

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C205S640000

Reexamination Certificate

active

07074317

ABSTRACT:
An electrochemical method is provided for producing trenches for trench capacitors in p-doped silicon with a very high diameter/depth aspect ratio for large scale integrated semiconductor memories. Trenches (macropores) having a diameter of less than about 100 nm and a depth of more than 10 μm can be produced on p-doped silicon having a very low resistivity at a high etching rate.

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Lehmann et al., The Physics of Macropore Formation in Low-Doped p-type Silicon, 1999, Journal of the Electrochemical Society, 146 (8), 1968-2975.
Propst, E. K. et al.: “The Electrochemical Oxidation of Silicon and Formation of Porous Silicon in Acetonitrile”, Journal of the. Electrochemical Society, vol. 141, No. 4, Apr. 1994, pp. 1006-1013.
Ohji, H. et al.: “Fabrication of Mechanical Structures in p-Type Silicon using Electrochemical Etching”, Sensors and Actuators, Elsevier, vol. 82, No. 1-3, May 2000, pp. 254-258.
E.A. Ponomarev et al.: “Macropore Formation on p-Type Si in Fluoride Containing Organic Electrolytes”,Electrochemical and Solid-State Letters,vol. 1, No. 1, 1998, pp. 42-45.

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