Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-12-20
2008-10-28
Geyer, Scott B. (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S029000, C438S257000, C257SE21190, C257SE21582
Reexamination Certificate
active
07442567
ABSTRACT:
An exemplary method for fabricating a transflective liquid crystal display is provided. The transflective liquid crystal display includes a substrate (200) having a transmission region (201) and a reflection region (202). The method includes: forming a transparent electrode layer (210), a buffer layer (220), and a reflective metal layer (230) on the substrate; forming a photo-resist layer (240) on the reflective metal layer; providing a photo-mask (300) comprising a first portion corresponding to the transmission region and a second portion corresponding to the reflection region, transmittance of the first portion being greater than transmittance of the second portion; exposing the photo-resist layer using the photo-mask and developing the exposed photo-resist layer; ashing the residual photo-resist in the transparent region; etching the reflective metal layer and the buffer layer in the transmission region; and removing the residual photo-resist in the reflection region.
REFERENCES:
patent: 7142271 (2006-11-01), Ko et al.
patent: 2005/0162597 (2005-07-01), Wachi
patent: 2006/0290872 (2006-12-01), Morii et al.
Lai Chien-Ting
Yan Tzu-Min
Ahmadi Mohsen
Chung Wei Te
Geyer Scott B.
Innolux Display Corp.
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