Method for fabricating tapered edges on integrated optoelectroni

Etching a substrate: processes – Forming or treating optical article

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 26, 216 48, 430321, G02B 625

Patent

active

057387982

ABSTRACT:
A method for etching a tapered edge on a cladding layer 10 of an integrated optical waveguide by simultaneously etching a cured droplet of photoresist 16 and the core cladding material to translate the profile of the droplet to the cladding to provide a larger cladding thickness at the interface to the optical fiber 20 and a taper to the cladding thickness needed to control the performance of the integrated optic device. Advantages include selective thinning of the core cladding while maintaining a low loss coupling of the optical fiber to the waveguide core on the integrated device, and higher yield in production during edge polishing.

REFERENCES:
patent: 4671609 (1987-06-01), Khoe et al.
patent: 4795722 (1989-01-01), Welch et al.
patent: 5402511 (1995-03-01), Malone et al.
patent: 5435887 (1995-07-01), Rothschild et al.
patent: 5439782 (1995-08-01), Haemmerle et al.
Naoaki Yamaguchi & Yasuo Kokubun, "Low-Loss Spot Size Transformer by Dual Tapered Waveguides (DTW-SST)", Journal of Light Wave Technology, Apr. 4, 1990, pp. 587-593.
N. Yamaguchi, Y. Kokubun, "Spot Size Convertor By Overlapping Of Two Tapered Waveguides", Electronic Letters, Jan. 19, 1989, vol. 25 No. 2, pp. 128-130.
J.T. Boyd, C.M. Chuang, & C.L. Chen, "Fabrication of Optical Waveguide Taper Couplers Utilizing SiO.sub.2 ", Applied Optics, Feb. 15, 1979, pp. 506-509.
Brinker and Scherer, "Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing", 1990, pp. 413-420.
Y.P. Joshi, "Shape of a Liquid Surface in Contact with a Solid", Eur. J. Phys., Aug. 1990, pp. 125-129.
Dietrich Marcuse, "Light Transmission Optics", 1982 Second Edition, pp. --10.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for fabricating tapered edges on integrated optoelectroni does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating tapered edges on integrated optoelectroni, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating tapered edges on integrated optoelectroni will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-632313

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.