Method for fabricating superconducting oxide thin films by activ

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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505732, 505730, 427 62, 4271263, 427 38, 427 39, 427 42, 4272553, B05D 512, B05D 306, C23C 1400

Patent

active

049506420

ABSTRACT:
A process for fabricating a superconducting oxide thin film is disclosed which comprises the steps of separately evaporating metal elements, of which the superconducting oxide thin film with a desired stoichiometry is to be composed, to a substrate and simultaneously irradiating the substrate with oxygen plasma generated by RF wave or ECR microwave to form a crystalline oxide film without further annealing.

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Laibowitz et al., "Thin Superconducting Oxide Films", Phys. Rev. B, vol. 35, No. 16 (1987), pp. 8821-8823.
Spah et al., "Parameters for in situ Growth of High Tc Superconducting Thin Films Using an Oxygen Plasma Source", Appl. Phys. Lett. 53(5), p. 441-443 (1988).
Bunshah et al. "Deposition Techologics for Films and Coatings", Chapt. 4, pp. 83-127, Noyes Publications 1982.
Landesman et al., "Magnetic and XPS Studies of YBa.sub.2 Cu.sub.3 O.sub.7-8 annealed in O.sub.2 Plasmas", AIP No. 165, Nov., 1987, pp. 389-396.
Tamura et al., "Effects of a Plasma Oxidation of YBa.sub.2 CuO.sub.7-8 Films", ISEC, 1987, Aug.
Thakoor et al., "Insulator Interface Effects in Sputter Deposited NbN/MgO/NbN (Superconductor-Insulator-Superconductor) Tunnel Junctions".
J. Vac. Soc. Technol. A5(4) 1987, p. 1721-1725.
Ono et al., "Election Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering", Jpn. J. Appl. Phys. 23 (1984) L 534-536.
Chi et al., "Superconducting A-15 Nb.sub.3 Ge Films Produced by Reactive Evaporation", Thin Solid Films 72 (1980) pp. 285-290.

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