Method for fabricating SiO.sub.2 film

Details Method for fabricating SiO.sub.2 film Method for fabricating SiO.sub.2 film

1998-05-01

1999-08-03

Bell, Janyce

Coating processes

Optical element produced

Polarizer, windshield, optical fiber, projection screen, or...

427226, 427387, B05D 506

Patent

active

059322837

ABSTRACT:
Disclosed is a method for fabricating SiO.sub.2 film used as the core layer or cladding layer of an optical waveguide that has the steps of: coating a polysilazane solution on a substrate; and sintering the substrate at a predetermined temperature to form SiO.sub.2 film on the substrate by using the pyrolysis reaction from polysilazane to SiO.sub.2.

REFERENCES:
patent: 5358739 (1994-10-01), Baney et al.
patent: 5761367 (1998-06-01), Matsumoto
"Low Temperature Process Of Silica Waveguides By Teos-03 Atmospheric Pressure CVD"--The 1996 IEICE General Conference, C-230 (1996) (no mo.).

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